Raman scattering in the aurivillius-layered ferroelectric SrBi2Ta2O9-Bi3TiNbO9 thin films

Citation
E. Ching-prado et al., Raman scattering in the aurivillius-layered ferroelectric SrBi2Ta2O9-Bi3TiNbO9 thin films, INTEGR FERR, 29(1-2), 2000, pp. A33-A41
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
INTEGRATED FERROELECTRICS
ISSN journal
10584587 → ACNP
Volume
29
Issue
1-2
Year of publication
2000
Pages
A33 - A41
Database
ISI
SICI code
1058-4587(2000)29:1-2<A33:RSITAF>2.0.ZU;2-A
Abstract
We have used Raman spectroscopy to investigate thin films of ferroelectric (SrBi2Ta2O9)(x)(Bi3TiNbO9)(1-x) layered structures and to compare them with the corresponding bulk materials. Various compositions, with x = 0.0, 0.2, 0.4, 0.6, 0.8, and 1.0, were prepared by metal organic solution deposition method on Pt/TiO2/SiO2/Si substrates. A topographic micro-Raman study reve aled very homogeneous films at each composition. The Raman spectrum of x = 0.0 film shows bands around 170, 232, 337, 522, 608, 677 and 832 cm(-1). wh ich indicates Bi3TiNbO9 formation. The evolution of the Raman bands with th e cm inclusion of SBT material shows frequency shifts and a broadening of t he bands due to the differences in mass between Sr acid Bi in the A-sites, and Ta, Ti, and Nb in the B-sites. A lower degree of crystallization was fo und in the films compared to the bulk due to the presence of stress in the films. Strong contributions from defects were also observed in the temperat ure-dependent Raman spectra.