Polycrystalline SrBi2Ta0.8Nb1.2O9 thin films

Citation
S. Srinivas et al., Polycrystalline SrBi2Ta0.8Nb1.2O9 thin films, INTEGR FERR, 29(1-2), 2000, pp. A99-A110
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
INTEGRATED FERROELECTRICS
ISSN journal
10584587 → ACNP
Volume
29
Issue
1-2
Year of publication
2000
Pages
A99 - A110
Database
ISI
SICI code
1058-4587(2000)29:1-2<A99:PSTF>2.0.ZU;2-0
Abstract
The growth, microstructure and micro-Raman properties of SrBi2Ta0.8Nb1.2O9 (SBTN) thin films deposited on Si(100) substrates using pulsed laser deposi tion (PLD) technique were studied at various substrate temperatures. Films were characterized using X-ray diffraction(XRD), atomic force microscopy(AF M), energy dispersive X-ray analysis (EDAX) and micro-Raman studies. AFM st udies indicated that the average grain size of the films increased between 0.08 mu m to 0.1 mu m with the increasing growth temperatures. Micro-Raman studies of SBTN films revealed the fact that shifting of Raman modes corres ponds to the BO6 (where B = Ta/Nb) octahedral symmetry, to higher frequenci es, is in accordance with the different masses of the B sire atoms and the force constants involved due to Nb doping at Ta sites.