The paper reports data on the kinetics of anodic oxide films growth on sili
con in aqueous solutions of phosphoric acids as well as a study of the morp
hology of the oxides grown in a special regime of the oscillating anodic po
tential. X-ray reflectivity measurements were performed on the samples of a
nodic oxides using an intense synchrotron radiation source. They have a mul
tilayer structure as revealed by theoretical fitting of the reflectivity da
ta. The oscillations of the anodic potential are explained in terms of sync
hronized oxidation/dissolution reactions at the silicon surface and accumul
ation of mechanical stress in the oxide film. (C) 2000 Elsevier Science S.A
. All rights reserved.