X-ray reflectivity study of formation of multilayer porous anodic oxides of silicon

Citation
R. Fenollosa et al., X-ray reflectivity study of formation of multilayer porous anodic oxides of silicon, MAT SCI E A, 288(2), 2000, pp. 235-238
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
ISSN journal
09215093 → ACNP
Volume
288
Issue
2
Year of publication
2000
Pages
235 - 238
Database
ISI
SICI code
0921-5093(20000915)288:2<235:XRSOFO>2.0.ZU;2-M
Abstract
The paper reports data on the kinetics of anodic oxide films growth on sili con in aqueous solutions of phosphoric acids as well as a study of the morp hology of the oxides grown in a special regime of the oscillating anodic po tential. X-ray reflectivity measurements were performed on the samples of a nodic oxides using an intense synchrotron radiation source. They have a mul tilayer structure as revealed by theoretical fitting of the reflectivity da ta. The oscillations of the anodic potential are explained in terms of sync hronized oxidation/dissolution reactions at the silicon surface and accumul ation of mechanical stress in the oxide film. (C) 2000 Elsevier Science S.A . All rights reserved.