Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography

We discuss the fabrication of a FLASH EEPROM floating gate memory device wi th a cell size of 0.0896 mu m. The floating gate level utilized an alternat ing aperture phase shift mask, a binary mask was used to expose the control gate level. Linewidth changes over topography, due to reflectivity variati ons, was controlled by an inorganic multilayer anti-reflective coating(1). All levels were exposed with a new generation of photoresists developed at Bell Laboratories with ARCH chemicals. Experiments were carried out to give some insight to the behavior of the materials and the viability of optical enhancement techniques. We have found that 193nm lithography with this new family of photoresists is reasonably proficient in the fabrication of devi ces with design rules of less than half the exposure wavelength.