Deep-ultraviolet contact photolithography

Authors
Goodberlet, JG Dunn, BL
Citation
Jg. Goodberlet et Bl. Dunn, Deep-ultraviolet contact photolithography, MICROEL ENG, 53(1-4), 2000, pp. 95-99
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
95 - 99
Database
ISI
SICI code
0167-9317(200006)53:1-4<95:DCP>2.0.ZU;2-P
Abstract
The patterning of 100 nm features via contact photolithography is described . Details of a conformable embedded-amplitude mask and pattern transfer int o a tri-layer resist with this mask are presented. In-plane pattern-placeme nt errors for this lithographic process have been measured to be less than 60 nm.