Sub-wavelength printing using multiple overlapping masks

Authors
Pau, S Nalamasu, O Cirelli, R Frackoviak, J Timko, A Watson, GP Klemens, F Timp, G
Citation
S. Pau et al., Sub-wavelength printing using multiple overlapping masks, MICROEL ENG, 53(1-4), 2000, pp. 119-122
Citations number
1
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
119 - 122
Database
ISI
SICI code
0167-9317(200006)53:1-4<119:SPUMOM>2.0.ZU;2-N
Abstract
A multiple exposure technique is used to print various types of patterns wi th critical dimensions much smaller than the wavelength of light used for e xposure. The process latitude of the exposure can be very large because it is limited by the large pattern of the individual mask and not by the criti cal dimension of the small feature.