Fabrication of high density nanostructures gratings (> 500Gbit/in(2)) usedas molds for nanoimprint lithography

We present an optimized process using very high resolution Electron Beam Li thography for the fabrication of high density nanostructures gratings, whic h can be used as molds for nanoimprint lithography. In our approach convent ional PolyMethylMethAcrylate resist is exposed and, after lift-off and Reac tive Ion Etching, pillars of 100 nm high are obtained on SiO2. Optimized co nditions for the development of the resist after exposure are presented whi ch enables the fabrication of high quality pillar gratings of 30nm pitch (s imilar to 700Gbit/in(2), and line gratings of 40nm pitch.