High resolution magnetic patterning using focused ion beam irradiation

Citation
C. Vieu et al., High resolution magnetic patterning using focused ion beam irradiation, MICROEL ENG, 53(1-4), 2000, pp. 191-194
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
191 - 194
Database
ISI
SICI code
0167-9317(200006)53:1-4<191:HRMPUF>2.0.ZU;2-Q
Abstract
We show how Focused Ion Beam irradiation can be used to modify the magnetic properties of a thin Co/Pt layer at a nanometric length-scale. The control of the injected ion dose enables the adjustment of the coercive field and the Curie temperature of the layer on localized parts of the sample. The me chanism induced during irradiation is identified as a collisional mixing pr ocess which incorporates some Pt into the Co layer thus lowering the Curie temperature. The ultimate resolution of this magnetic patterning technique is discussed.