A study of multiple scattering effect with 10 kV e-beam system

Citation
Cu. Jeon et al., A study of multiple scattering effect with 10 kV e-beam system, MICROEL ENG, 53(1-4), 2000, pp. 287-290
Citations number
6
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
287 - 290
Database
ISI
SICI code
0167-9317(200006)53:1-4<287:ASOMSE>2.0.ZU;2-1
Abstract
Multiple scattering effect is discussed with a low voltage e-beam system. A test layout is designed to figur out the multiple scattering effect. A dar k erosion is studied to identify the scattering range. The range i found to be as far as similar to 15mm with our 10kV e-beam system. The effective sc attering doses are 5.6% an 5.3% in terms of CD variation for beam spot size s of 0.15um and 0.3um, respectively. CD variation between: features in non- multiple scattered area and those in multiple scattered is 22nm-31nm that i s not negligible for small features.