Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

Aromatic polymers based on methacrylates (linear polymers) and multifunctio nal allylesters (crosslinked polymers) have been prepared. They feature hig h dry etch resistance and good imprintability in a hot embossing process. T he crosslinked polymers and their prepolymers were investigated in detail. Their characteristic molecular weight distribution and thermo-mechanical be haviour were studied with respect to the crosslinking process and compared with those of linear polymers. The thermal stability of imprinted patterns has been investigated for both, linear and crosslinked aromatic polymers. T he latter ones show excellent stability up to test temperatures of 200 degr ees C directly after the imprint process.