Beam-assisted-etching technique for fabrication of single crystal diamond field emitter tip

Authors
Taniguchi, J Yokoyama, J Komuro, M Hiroshima, H Miyamoto, I
Citation
J. Taniguchi et al., Beam-assisted-etching technique for fabrication of single crystal diamond field emitter tip, MICROEL ENG, 53(1-4), 2000, pp. 415-418
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
415 - 418
Database
ISI
SICI code
0167-9317(200006)53:1-4<415:BTFFOS>2.0.ZU;2-A
Abstract
We fabricated a single crystal diamond field emitter tip using focused ion beam assisted etching and investigated characteristics of electron emission from single crystal diamond. Electron emission from single crystal diamond is field emission. FIB assisted etching is very useful to reduce emission site.