Optimization of an advanced positive tone DUV photoresist towards 150 nm and beyond

Authors
Ercken, M Moelants, M Vandenberghe, G Goethals, M Ronse, K Masuda, S Spiess, W Pawlowski, G
Citation
M. Ercken et al., Optimization of an advanced positive tone DUV photoresist towards 150 nm and beyond, MICROEL ENG, 53(1-4), 2000, pp. 443-447
Citations number
2
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
443 - 447
Database
ISI
SICI code
0167-9317(200006)53:1-4<443:OOAAPT>2.0.ZU;2-L