Characterisation of the ultrasonic development process in UVIII resist

Authors
Yasin, S Mumtaz, A Hasko, DG Carecenac, F Ahmed, H
Citation
S. Yasin et al., Characterisation of the ultrasonic development process in UVIII resist, MICROEL ENG, 53(1-4), 2000, pp. 471-474
Citations number
11
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
471 - 474
Database
ISI
SICI code
0167-9317(200006)53:1-4<471:COTUDP>2.0.ZU;2-8
Abstract
The effect of ultrasonically assisted development on the characteristics of electron beam exposed UVIII resist is investigated. Process latitude, ulti mate resolution and line edge roughness are seen to be improved compared to conventional dip development. The mechanisms for this improvement are disc ussed.