Development mechanism study by dissolution monitoring of positive methacrylate photoresists

The development mechanisms of two polymethacrylate non-chemically amplified resists are investigated and compared using dissolution-monitoring experim ents and simulation. The first of these two resists is PMMA and the second an experimental Hydroxy functionalised PolyMethacrylate Positive resist (HP MAP). The imaging chemistries of the two resists are closely related, but d ifferent dissolution mechanisms are revealed with this study. Swelling phen omena are encountered in the hydroxy functionalised material, although an a queous base developer is used in this case.