Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensors

Citation
L. Montelius et al., Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensors, MICROEL ENG, 53(1-4), 2000, pp. 521-524
Citations number
4
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
521 - 524
Database
ISI
SICI code
0167-9317(200006)53:1-4<521:NAUMPF>2.0.ZU;2-K
Abstract
A complete nanobiosensor structure consisting of a 200 mu m x 200 mu m area containing 100 nm sized interdigitated nanoelectrodes with varied interele ctrode distances has been fabricated using nanoimprint lithography (NIL) in combination with UV-lithography. The complete structure has been character ized with admittance spectroscopy. In the paper are discussed the needs and key issues for nanosensors and the capability offered by using NIL for fab rication of such sensors.