L. Montelius et al., Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensors, MICROEL ENG, 53(1-4), 2000, pp. 521-524
A complete nanobiosensor structure consisting of a 200 mu m x 200 mu m area
containing 100 nm sized interdigitated nanoelectrodes with varied interele
ctrode distances has been fabricated using nanoimprint lithography (NIL) in
combination with UV-lithography. The complete structure has been character
ized with admittance spectroscopy. In the paper are discussed the needs and
key issues for nanosensors and the capability offered by using NIL for fab
rication of such sensors.