Micromachined silicon grisms: high resolution spectroscopy in the near infrared

Authors
Cianci, E Foglietti, V Vitali, F Lorenzetti, D Notargiacomo, A Giovine, E
Citation
E. Cianci et al., Micromachined silicon grisms: high resolution spectroscopy in the near infrared, MICROEL ENG, 53(1-4), 2000, pp. 543-546
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONIC ENGINEERING
ISSN journal
01679317 → ACNP
Volume
53
Issue
1-4
Year of publication
2000
Pages
543 - 546
Database
ISI
SICI code
0167-9317(200006)53:1-4<543:MSGHRS>2.0.ZU;2-L
Abstract
Silicon grisms are very attractive devices as they allow for a spectroscopi c mode able to effectively complement the natural imaging mode of IR camera s, providing high spectral resolution. In this paper we describe progress t oward the realization of silicon grisms by means of chemical etching and el ectron-beam lithography.