Analysis of nonlinearity in a high-resolution grating interferometer

Citation
Dj. Lin et al., Analysis of nonlinearity in a high-resolution grating interferometer, OPT LASER T, 32(2), 2000, pp. 95-99
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS AND LASER TECHNOLOGY
ISSN journal
00303992 → ACNP
Volume
32
Issue
2
Year of publication
2000
Pages
95 - 99
Database
ISI
SICI code
0030-3992(200003)32:2<95:AONIAH>2.0.ZU;2-T
Abstract
Metrological feasibilities of a high-resolution grating interferometer (GI) based on a transverse Zeeman laser are investigated. When the grating pitc h equals 20 mu m, a resolution of 0.7 nm is obtained by means of a heterody ne signal processing method. The comparison of two approaches for determini ng the residual nonlinearity is presented. One is to evaluate the maximum r esidual error by determining the amplitude modulation degree of the measure ment signal. The other is to do a high precision calibration with a differe ntial dual-frequency interferometer that has a higher precision. The experi mental results show that the nonlinearity is no more than 25 nm which fits well with the estimating result. Analysis of the depolarization effect of t he grating indicates that it has little influence on the measurement accura cy. (C) 2000 Elsevier Science Ltd. All rights reserved.