230 to 250 nm intense emission from AlN/AlGaN quantum wells
Citation
H. Hirayama et al., 230 to 250 nm intense emission from AlN/AlGaN quantum wells, PHYS ST S-A, 180(1), 2000, pp. 157-161
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
SICI code
0031-8965(20000716)180:1<157:2T2NIE>2.0.ZU;2-6
Abstract
We demonstrate 230 to 250 nm efficient ultraviolet (UV) photoluminescence (
PL) from AIN(AlGaN)/AlGaN multi-quantum-wells (MQWs) fabricated by metal-or
ganic vapor-phase-epitaxy (MOVPE). Firstly, we show the PL spectra of AlxGa
1-xN on SIC over the whole compositional range, i.e. from GaN to AIN, emitt
ing from near band-edge. We observed a drastic intensity enhancement of PL
emission by small incorporation of GaN into AIN. We systematically investig
ated the PL properties of AlGaN MQWs consisting of wide bandgap AlGaN (Al c
ontent: 53 to 100%) barriers. We obtained efficient PL emission of 234 and
245 nm from AlN/Al0.18Ga0.82N and Al0.8Ga0.2N/Al0.18Ga0.82 MQWs, respective
ly, at 77 K. The emission from the AlGaN MQWs were several ten times strong
er than that of bulk AlGaN. We found that the PL from AlGaN MQW is as effic
ient as that of InGaN QWs at 77 K.