Citation
Bg. Kim et al., Beneath the MEEF, SOL ST TECH, 43(8), 2000, pp. 107
Citations number
2
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
SOLID STATE TECHNOLOGY
ISSN journal
0038111X
→ ACNP
Volume
43
Issue
8
Year of publication
2000
Database
ISI
SICI code
0038-111X(200008)43:8<107:BTM>2.0.ZU;2-X
Abstract
The effects responsible far enhancing small photomask CD errors are the sam
e as those which narrow the exposure latitude. Innovations that increase th
e process window also reduce the mask error enhancement factor, thus doubly
improving yield.