M. Della Negra et al., The structure of an ultrathin VOx (x approximate to 1) film grown epitaxially on TiO2 (110), SURF SCI, 461(1-3), 2000, pp. 118-128
The analysis by means of multiple scattering cluster (MSC) calculations of
full 2 pi V 2p, Ti 2p and O Is X-ray photoelectron diffraction (XPD) patter
ns from an ultrathin film (similar to 4ML) of VOx (x approximate to 1) depo
sited on the (1 x 1)-TiO2 (110) (rutile) surface leads to a detailed determ
ination of the structure and orientation of the overlayer and of its epitax
ial relationship with the substrate. The comparison of XPD experimental dat
a to theoretical simulations confirms the NaCl-like stacking of the overlay
er which is suggested by the direct observation of the experimental 2 pi: p
lots and reveals its (100) orientation. The [001] azimuth of the overlayer
is aligned with the [(1) over bar 12] direction on the substrate surface an
d the overlayer experiences an orthorhombic tensile strain (+7%) in order t
o match the substrate epitaxially, with a consequent 12-16% vertical interl
ayer spacing contraction. The atomic scale morphology of the (1 x 1)-TiO2 (
110) surface induces a strong buckling in the overlayer along the [(1) over
bar 10] substrate direction [0.5+/-0.1 Angstrom]. (C) 2000 Elsevier Scienc
e B.V. All rights reserved.