M. Fukumoto et al., The effect of temperature and water vapor on the initial stage of high temperature oxidation of an Fe-1.5mass%Si alloy, TETSU HAGAN, 86(8), 2000, pp. 526-533
Citations number
11
Categorie Soggetti
Metallurgy
Journal title
TETSU TO HAGANE-JOURNAL OF THE IRON AND STEEL INSTITUTE OF JAPAN
The initial stage of oxidation (up to 600 s) in air and air-H2O atmospheres
was investigated for Fe and an Fe-1.5mass%Si alloy at 1373 and 1473K. The
oxidation kinetics of Fe nas parabolic at both 1373 and 1473K and the parab
olic rate constants are very similar in both air and air-H2O. For the Fe-1.
5Si, at 1373K the oxidation amounts increased rapidly alter an incubation p
eriod (up to 400 s) in air-H2O, while at 1473K oxidation obeyed a linear ra
te law in both air and air-H2O, because a liquid phase uas formed with FeO
and Fe2SiO4. The linear rate constants were very similar both in air and in
air-H2O. In Pt-marker experiments in air-H2O for Fe-1.5Si it was found tha
t the Pt-marker located between external Fe-oxide and inner FeO + Fe2SiO4 l
ayers at 1373K, while at 1473K the Pt-marker located on the alloy surface.
The thickness of each layer was measured as a function of time at 1373K; in
air-H2O. it was found that after an Si-rich oxide (SiO2 + Fe2SiO4) layer a
t the initial stage of oxidation disappeared a thick inner FeO + Fe2SiO4 la
yer formed accompanied by the formation of Fe3O4 inside the outer Fe2O3 sca
le. Rapid oxidation after 400 s proceeded with the growth of an FeO layer i
n the surface scale. The change of the Si-rich oxide layer to an FeO + Fe2S
iO4 mixture is due to penetration of water molecules. A combined process of
perforating dissociation and transport of water molecules was suggested to
be the cause of the rapid growth of the inner layer.