GaAs quantum wire lasers grown on v-grooved substrates isolated by self-aligned ion implantation

Citation
C. Percival et al., GaAs quantum wire lasers grown on v-grooved substrates isolated by self-aligned ion implantation, IEEE DEVICE, 47(9), 2000, pp. 1769-1772
Citations number
17
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
47
Issue
9
Year of publication
2000
Pages
1769 - 1772
Database
ISI
SICI code
0018-9383(200009)47:9<1769:GQWLGO>2.0.ZU;2-6
Abstract
Multiple vertically stacked GaAs/AlxGa1-xAs quantum wires laser diodes have been fabricated via MOVPE on v-grooved Galls substrates, The devices are e lectrically isolated by oxygen ion implantation, utilizing the nonplanarity of the device. The process is self-aligning and requires no masking, yield ing significant simplification in the device fabrication. Optimum implant c onditions are determined. A quantum internal efficiency of 65.8% is measure d for the optimum implanted devices, which exhibit a 5.5 mA threshold curre nt.