Focus characterization using end of line metrology

A new method is introduced to measure relative focus using conventional opt ical overlay instruments, Optical end of line metrology (OELM), is based on patterning a wide frame in which adjacent sides are constructed of submicr on sized lines that run perpendicular to the center opening. Because trunca tion is size dependent, line and space features exhibit significantly more line shortening effects than the solid sections. When measured with a conve ntional optical overlay tool, the difference in line shortening between the solid and line and space sections are measured as an alignment offset, whi ch is a relative measure of actual line shortening, Reproducibility for mea suring the apparent misalignment of these modified box-in-box structures wa s 3 nm (3 sigma(est)), which is similar to the repeatability for measuring conventional resist box in box alignment boxes. Truncation is sensitive to focus and the utility for using OELM toward char acterizing focus-dependent lens parameters was investigated. Estimated 3 si gma for calculating best focus and astigmatism were 0.04 mu m and 0.01 mu m , respectively. Focus corrections were accurate to 0.05 mu m within +/-0.3 mu m of best focus, Additionally, a general method is presented to estimate the error in the calculated best focus.