A control method to reduce the standard deviation of flow time in wafer fabrication

Authors
Citation
Hj. Yoon et Dy. Lee, A control method to reduce the standard deviation of flow time in wafer fabrication, IEEE SEMIC, 13(3), 2000, pp. 389-392
Citations number
8
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
ISSN journal
08946507 → ACNP
Volume
13
Issue
3
Year of publication
2000
Pages
389 - 392
Database
ISI
SICI code
0894-6507(200008)13:3<389:ACMTRT>2.0.ZU;2-K
Abstract
This paper proposes a control method for reducing flow time variability in a wafer fabrication facility with multiple wafer types. We employ stochasti c petri nets to model and analyze the machine module, and define operation due dates using a novel utilization index metric. An operation due date (OP NDD) rule for lot dispatch is proposed and evaluated against other tot disp atch policies.