Nature of Friedel oscillations around Si dopants in the GaAs(110) accumulation layer

Citation
Je. Inglesfield et al., Nature of Friedel oscillations around Si dopants in the GaAs(110) accumulation layer, J PHYS-COND, 12(30), 2000, pp. L489-L496
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS-CONDENSED MATTER
ISSN journal
09538984 → ACNP
Volume
12
Issue
30
Year of publication
2000
Pages
L489 - L496
Database
ISI
SICI code
0953-8984(20000731)12:30<L489:NOFOAS>2.0.ZU;2-T
Abstract
The screening of sub-surface Si impurities in an accumulation layer at the GaAs(110) surface is calculated. Such an accumulation layer can be induced by a scanning tunnelling microscope tip, and surface Friedel oscillations h ave been imaged around the Si dopants. This study uses the effective mass a pproximation to describe the electrons in the GaAs conduction band, and a f itted model potential for the impurity. Two-dimensional effects dominate, w ith a doubly occupied bound state pulled off the lowest sub-band by the imp urity, and a depletion of one electron in the conduction states. The bound state gives a large central peak in the surface induced charge, with the Fr iedel oscillations coming from the change in the conduction states. To expl ain the amplitude of the observed oscillations, it is necessary to reduce t he tunnelling contribution from the bound state.