Wb. Li et al., A KINETIC-MODEL FOR REACTION BONDING PROCESS OF SILICON POWDER COMPACT, Journal of the European Ceramic Society, 17(9), 1997, pp. 1119-1131
In order to obtain detailed information about the kinetics and the rea
ction nature of a complex reaction process like reaction bonding of si
licon nitride mathematical modelling of the process is necessary. The
previous quantitative models for this process have been based only on
the mechanism that the nitrogen diffuses through the solid silicon nit
ride without taking into account the multiple reaction mechanisms. In
the present study, a comprehensive kinetic model, which is based on an
alysis of the multiple mechanisms in a silicon powder compact reacting
with nitrogen gas and forming silicon nitride, is constructed for a s
olid-gas reaction bonding process with specific application to the rea
ction-bonding of silicon nitride. The model will incorporate the rate
equation for each mechanism into a constitutive equation from which mo
re complete information of process kinetics can be predicted. The resu
lts predicted by the present model have been compared with previous ex
perimental results and satisfactory agreement obtained. (C) 1997 Elsev
ier Science Limited.