Ion-pumping mechanism in a pulsed Penning source: application to the production of multiply charged ions

Citation
Y. Sato et al., Ion-pumping mechanism in a pulsed Penning source: application to the production of multiply charged ions, NUCL INST A, 450(2-3), 2000, pp. 231-234
Citations number
5
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
ISSN journal
01689002 → ACNP
Volume
450
Issue
2-3
Year of publication
2000
Pages
231 - 234
Database
ISI
SICI code
0168-9002(20000811)450:2-3<231:IMIAPP>2.0.ZU;2-1
Abstract
The neutral atom density of a low-duty pulsed Penning ionized-gauge ion sou rce (PIGIS) is sharply pulsed, according to the pulsed ion current into the cathode, which should act as a periodic ion pump in the plasma column of P IGIS. A high yield of multiply charged ions (Ar8+, 250-300 e mu A; Ar7+, si milar to 1000 e mu A) can thus be obtained under a reasonably low gas press ure during a short time (of the order of millisecond), which is sufficientl y long for injection ( similar to 160 mu s) into the heavy-ion medical sync hrotron (HIMAC) at NIRS. (C) 2000 Published by Elsevier Science B.V. All ri ghts reserved.