J. Canning et al., Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation, APPL OPTICS, 39(24), 2000, pp. 4296-4299
Complete birefringence compensation is demonstrated in plasma-enhanced chem
ical vapor deposition waveguides by 193-nm postexposure. A single relaxatio
n process dominates the decay in stress anisotropy, indicating that compres
sive stress from the substrate leads to an elastic stress anisotropy at the
core. (C) 2000 Optical Society of America OCIS codes: 050.1950, 050.2770,
130.3130, 130.1750, 230.1950, 230.3120.