Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation

Citation
J. Canning et al., Birefringence control in plasma-enhanced chemical vapor deposition planar waveguides by ultraviolet irradiation, APPL OPTICS, 39(24), 2000, pp. 4296-4299
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
39
Issue
24
Year of publication
2000
Pages
4296 - 4299
Database
ISI
SICI code
0003-6935(20000820)39:24<4296:BCIPCV>2.0.ZU;2-V
Abstract
Complete birefringence compensation is demonstrated in plasma-enhanced chem ical vapor deposition waveguides by 193-nm postexposure. A single relaxatio n process dominates the decay in stress anisotropy, indicating that compres sive stress from the substrate leads to an elastic stress anisotropy at the core. (C) 2000 Optical Society of America OCIS codes: 050.1950, 050.2770, 130.3130, 130.1750, 230.1950, 230.3120.