The composition distribution of Ge(Si)/Si (001) islands grown at 700 degree
s C by molecular beam epitaxy is investigated using high-spatial resolution
x-ray energy dispersive spectrometry in a scanning transmission electron m
icroscope. Island shapes are investigated using cross-section transmission
electron microscopy. Results show nonuniformity of the composition distribu
tion in the islands, which affects the evolution of the aspect ratios of he
ight-to-base diameter of dislocated islands. (C) 2000 American Institute of
Physics. [S0003-6951(00)05235-9].