Interdiffusion in NiFe/Cu/NiFe trilayers: Possible failure mechanism for magnetoelectronic devices (vol 77, pg 358, 2000)

Authors
Bruckner, W Baunack, S Hecker, M Monch, JI van Loyen, L Schneider, CM
Citation
W. Bruckner et al., Interdiffusion in NiFe/Cu/NiFe trilayers: Possible failure mechanism for magnetoelectronic devices (vol 77, pg 358, 2000), APPL PHYS L, 77(7), 2000, pp. 1064-1064
Citations number
1
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
77
Issue
7
Year of publication
2000
Pages
1064 - 1064
Database
ISI
SICI code
0003-6951(20000814)77:7<1064:IINTPF>2.0.ZU;2-5