Surface accumulation method, called the Hwang-Balluffi method [J.C.M. Hwang
, J.D. Pan and R.W. Balluffi, J. Appl. Phys., 50(3), 1979, 1339], was appli
ed to measure the grain-boundary diffusion of Ag at low temperatures (413 a
nd 428 K) in a nanocrystalline Cu film. Ag atoms from the Ag layer diffused
through the copper nanocrystalline film along the grain boundaries to the
opposite surface (i.e. the accumulation surface) where they spread out by r
apid surface diffusion and accumulated. The rate of accumulation was detect
ed by Auger Electron Spectroscopy (AES). It was shown that the results are
not sensitive to the supposition whether accumulation takes place in one or
two monolayers of the surface. TEM observations have been made in the same
time before and after heat treatment to check the stability of the nanostr
ucture. (C) 2000 Elsevier Science B.V. All rights reserved.