Negative electron affinity and electron emission at cesiated GaN and AlN surfaces

Authors
Citation
Ci. Wu et A. Kahn, Negative electron affinity and electron emission at cesiated GaN and AlN surfaces, APPL SURF S, 162, 2000, pp. 250-255
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
162
Year of publication
2000
Pages
250 - 255
Database
ISI
SICI code
0169-4332(200008)162:<250:NEAAEE>2.0.ZU;2-4
Abstract
The electronic structure of GaN and AlN (0001) surfaces and modification by cesium (Cs) adsorption are investigated via ultra-violet and X-ray photoem ission spectroscopy (UPS, XPS) and total yield spectroscopy. The electron a ffinity (EA) of the clean and ordered 1 X 1 surfaces is found to be equal t o 3.3 and 1.9 eV for GaN and AlN, respectively. Cs adsorption (with the hel p of oxygen pre-treatment in the case of GaN) reduces EA on both surfaces b y about 2.6-2.8 eV, leading to true negative electron affinity (NEA) in the case of AlN and effective NEA in the case of GaN. Total yield spectroscopy confirms NEA on both surfaces. (C) 2000 Elsevier Science B.V, All rights r eserved.