Electronic structure of alpha and gamma phases of Si(111)-root 3 x root 3-Sn

Citation
A. Charrier et al., Electronic structure of alpha and gamma phases of Si(111)-root 3 x root 3-Sn, APPL SURF S, 162, 2000, pp. 375-379
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
162
Year of publication
2000
Pages
375 - 379
Database
ISI
SICI code
0169-4332(200008)162:<375:ESOAAG>2.0.ZU;2-H
Abstract
This work presents a detailed comparison of the electronic properties of tw o phases (alpha and gamma) of the prototypical Si(111)- root 3 x root 3-Sn system, focussing on the empty surface states. The latter reconstruction ha s been studied at room temperature with inverse photoemission (KRIPES). For the gamma-phase characterised by an equal amount of Sn and Si adatoms, a c harge transfer towards the Sn adatom leaves an empty surface state localise d on Si adatoms, and observed in KRIPES 0.4 eV above the Fermi level (E-F) at the surface Brillouin zone (SBZ) center. The band gap of this semiconduc ting gamma-phase is estimated around 0.5 eV. In contrast, the alpha phase w ith only Sn adatoms shows a metallic behaviour and two distinct adatom-deri ved empty surface states. (C) 2000 Elsevier Science B.V. All rights reserve d.