Nanostructures obtained by self-organization of silicon surfaces

Citation
B. Rottger et al., Nanostructures obtained by self-organization of silicon surfaces, APPL SURF S, 162, 2000, pp. 595-598
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
APPLIED SURFACE SCIENCE
ISSN journal
01694332 → ACNP
Volume
162
Year of publication
2000
Pages
595 - 598
Database
ISI
SICI code
0169-4332(200008)162:<595:NOBSOS>2.0.ZU;2-W
Abstract
An overview of the formation of reconstructed facets on vicinal surfaces of Si(111), Si(100) and Si(110) is given, which have been observed by using s canning tunneling microscopy (STM). Most of the samples have been prepared by mechanical grinding, subsequent chemical etching leading to concave-shap ed surfaces and by in situ treatment of high-index Si wafers. The orientati on of the experimentally observed facets are represented in a stereographic projection, which allows the recognition of more general trends in facet f ormation. Moreover, it provides information on the availability of unit cel ls in a wide range of sizes and may therefore become important for the grow th of self-organized surface structures. (C) 2000 Published by Elsevier Sci ence B.V.