Characterization of crystalline TiC films grown by pulsed Nd : YAG laser deposition

Citation
Y. Suda et al., Characterization of crystalline TiC films grown by pulsed Nd : YAG laser deposition, JPN J A P 1, 39(7B), 2000, pp. 4575-4576
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
39
Issue
7B
Year of publication
2000
Pages
4575 - 4576
Database
ISI
SICI code
Abstract
Titanium cal bide (TiC) thin films have been grown on Si (100) substrates u sing a pulsed neodymium: yttrium-aluminum-garnet (Nd:YAG) laser deposition method. X-ray diffraction (XRD) pattern of the TiC film shows that substrat e temperature is one of the most important parameters in the fabrication of crystalline TiC film. Crystalline TiC films can be prepared at substrate t emperatures above 500 degrees C. Field emission scanning electron microscop e (FE-SEM) indicates that the surface of the film is very smooth and pinhol e-free.