Experimental and simulated results of room temperature single electron transistor formed by atomic force microscopy nano-oxidation process

Citation
Y. Gotoh et al., Experimental and simulated results of room temperature single electron transistor formed by atomic force microscopy nano-oxidation process, JPN J A P 1, 39(4B), 2000, pp. 2334-2337
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
39
Issue
4B
Year of publication
2000
Pages
2334 - 2337
Database
ISI
SICI code
Abstract
A planar-type single electron transistor (SET) was fabricated by the atomic force microscopy (AFM) nano-oxidation process. The fabricated SET showed t he Coulomb oscillation characteristic with the period of about 2 V at room temperature. From the three-dimensional simulation, it is found out that th e smaller the SET island size, the smaller the tunnel junction capacitance, and the tunnel junction capacitance shows a weak dependence on the tunnel junction width. Using the analytical model, the reason for this weak depend ence was clarified.