Thermal analysis on the amorphous carbon nitride prepared by reactive magnetron sputtering

Citation
Xc. Xiao et al., Thermal analysis on the amorphous carbon nitride prepared by reactive magnetron sputtering, JPN J A P 2, 39(5A), 2000, pp. L420-L422
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
39
Issue
5A
Year of publication
2000
Pages
L420 - L422
Database
ISI
SICI code
Abstract
The differential thermal analysis-thermogravimetry-mass spectroscopy (DTA-T G-MS) study on the thermal stability of CNx prepared by magnetron sputterin g was carried out under Ar atmosphere. The results show that the decomposit ion processes could be divided into two stages. One spans from room tempera ture (RT) to 800 degrees C. The nitrogen loss as well as the weight loss in the a-CNx could be attributed to the evaporation of C+(m/z = 12), CN+(m/z = 26), O-2(+)(m/z = 32), CO2+(m/z = 44), NO2+(m/z = 46), and C2N2+(m/z = 52 ), as detected by mass spectroscopy. The other is above 800 degrees C, duri ng which the breakage of C-N bonds and the oxidation of C and N mainly acco unts for the weight loss. The weight loss of a-CNx is 7% for the first stag e and 42.8% for the second, suggesting the a-CNx to be more stable at low t emperature.