Annealing of nonhydrogenated amorphous carbon films prepared by filtered cathodic arc deposition

Citation
Or. Monteiro et al., Annealing of nonhydrogenated amorphous carbon films prepared by filtered cathodic arc deposition, J APPL PHYS, 88(5), 2000, pp. 2395-2399
Citations number
31
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
5
Year of publication
2000
Pages
2395 - 2399
Database
ISI
SICI code
0021-8979(20000901)88:5<2395:AONACF>2.0.ZU;2-O
Abstract
The effect of postdeposition annealing to 600 degrees C in vacuum on the ha rdness, modulus, film stress, and sp(3) content of nonhydrogenated amorphou s carbon was studied. The films were deposited using a filtered cathodic ar c source and the film properties were varied by controlling the substrate b ias. In films with an initial sp(3) content of greater than 80% a significa nt decrease (from 10.5 GPa to less than 2 GPa) in the level of compressive stress was observed without deterioration of the mechanical properties. In films with an initial sp(3) content of 50%, the stress and hardness remaine d constant. Films with lower sp(3) content showed a significant increase in the level of stresses and only a marginal decrease in hardness. The evolut ion of stresses and hardness with annealing is discussed in light of a prop osed microstructure of these amorphous films. (C) 2000 American Institute o f Physics. [S0021-8979(00)03618-5].