Dj. Kim et al., Thermal activation energies of Mg in GaN : Mg measured by the Hall effect and admittance spectroscopy, J APPL PHYS, 88(5), 2000, pp. 2564-2569
A series of GaN:Mg structures were grown in molecular beam epitaxy, using e
ither one or two rf nitrogen sources, and in metalorganic chemical vapor de
position systems with varying Mg flux. Acceptor energies were measured usin
g the Hall effect and admittance spectroscopy techniques. The acceptor ener
gies were found to be different for the two methods, i.e., 135-155 meV for
the Hall effect measurement and 80-115 meV for the admittance spectroscopy
measurement. The apparently small acceptor energies from the admittance spe
ctroscopy measurement were explained, through a simulation process, by the
combined effects of (1) high Mg acceptor concentration with no other free c
arrier sources, and (2) the Mg emission kinetics assisted by the Frenkel-Po
ole field effect in the GaN:Mg structures. (C) 2000 American Institute of P
hysics. [S0021-8979(00)06616-0].