Photoionization spectroscopy of traps in GaN metal-semiconductor field-effect transistors

Citation
Pb. Klein et al., Photoionization spectroscopy of traps in GaN metal-semiconductor field-effect transistors, J APPL PHYS, 88(5), 2000, pp. 2843-2852
Citations number
34
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
5
Year of publication
2000
Pages
2843 - 2852
Database
ISI
SICI code
0021-8979(20000901)88:5<2843:PSOTIG>2.0.ZU;2-G
Abstract
Measurements of the spectral and intensity dependences of the optically-ind uced reversal of current collapse in a GaN metal-semiconductor field-effect transistor (MESFET) have been compared to calculated results. The model as sumes a net transfer of charge from the conducting channel to trapping stat es in the high-resistivity region of the device. The reversal, a light-indu ced increase in the trap-limited drain current, results from the photoioniz ation of trapped carriers and their return to the channel under the influen ce of the built-in electric field associated with the trapped charge distri bution. For a MESFET in which two distinct trapping centers have been spect rally resolved, the experimentally measured dependence upon light intensity was fitted using this model. The two traps were found to have very differe nt photoionization cross-sections but comparable concentrations (4x10(11) c m(-2) and 6x10(11) cm(-2)), suggesting that both traps contribute comparabl y to the observed current collapse. [S0021-8979(00)00417-5].