Analyses of edge effects on residual stresses in film strip/substrate systems

Authors
Citation
Ch. Hsueh, Analyses of edge effects on residual stresses in film strip/substrate systems, J APPL PHYS, 88(5), 2000, pp. 3022-3028
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
88
Issue
5
Year of publication
2000
Pages
3022 - 3028
Database
ISI
SICI code
0021-8979(20000901)88:5<3022:AOEEOR>2.0.ZU;2-Y
Abstract
The residual stress distribution in a thin-film strip overlaid on a substra te is influenced by the edges of the strip. An analytical model is develope d to derive a closed-form solution for the stress distribution along the fi lm width. Because the film is much thinner than the substrate, the stress v ariation through the film thickness is ignored; however, the stress variati on through the substrate thickness is considered in the analysis. Compared to the existing analytical models, the present model is more rigorous and t he analytical results agree better with both finite element results and exp erimental measurements. (C) 2000 American Institute of Physics. [S0021-8979 (00)02218-0].