S. Tada et al., Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy, J APPL PHYS, 88(4), 2000, pp. 1756-1759
The absolute nitrogen (N) atom density in an electron-beam-excited plasma (
EBEP) operating at an ultralow pressure has been investigated by vacuum ult
raviolet absorption spectroscopy, employing a microdischarge hollow-cathode
lamp. The measured N atom density was estimated to be around 6x10(11) cm(-
3), and the dissociation fraction was 4.9% at a N-2 pressure of 0.05 Pa, an
electron-beam current of 10 A, and an electron-beam acceleration voltage o
f 120 V. The EBEP potentially enables us to control the electron density an
d electron energy independently with the electron-beam current and electron
-beam acceleration voltages, respectively. It was found that N atom densiti
es increased with increasing electron-beam current and electron acceleratio
n voltage under low-pressure conditions. The EBEP shows great promise as a
N atom source operating at an ultralow pressure. (C) 2000 American Institut
e of Physics. [S0021-8979(00)01616-9].