Quasistatic capacitance-voltage characteristics of plane-parallel structure
s of the semi-insulating GaAs with two metal contacts are calculated numeri
cally. The model of residual shallow acceptors compensated for by an excess
of deep donors is used for the semi-insulating GaAs. Under consideration i
s the relaxation regime for the charge transport in the semi-insulator. We
analyze metal/semi-insulator/metal structures for various parameters of the
metal contacts and of the semi-insulator. It is shown that a negative capa
citance can be obtained in some cases. A more detailed analysis is performe
d for the following structure: p-type like metal contact/n-type semi-insula
tor/n-type like metal contact. (C) 2000 American Institute of Physics. [S00
21- 8979(00)01516-4].