Hot-electron transport processes in ballistic-electron emission microscopyat Au-Si interfaces

Citation
M. Dahne-prietsch et T. Kalka, Hot-electron transport processes in ballistic-electron emission microscopyat Au-Si interfaces, J ELEC SPEC, 109(1-2), 2000, pp. 211-222
Citations number
47
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
ISSN journal
03682048 → ACNP
Volume
109
Issue
1-2
Year of publication
2000
Pages
211 - 222
Database
ISI
SICI code
0368-2048(200008)109:1-2<211:HTPIBE>2.0.ZU;2-1
Abstract
Ballistic-electron emission microscopy (BEEM) allows to study the transport of hot electrons in thin films and at buried interfaces with a lateral res olution in the nanometer range. In this review, the relevant transport proc esses are described in detail. For the particular case of the interface bet ween thin Au films and n-type Si(111), BEEM results are presented. In BEEM imaging, it is observed that the collector current increases when the tip i s located at terrace edges of the Au film. This effect demonstrates an impr oved matching of the populated electron states in the metal with the conduc tion-band states in the semiconductor in the case of electron injection at a terrace edge. It indicates a strong influence of the electronic structure of the metal on hot-electron transport as well as a predominant conservati on of lateral momentum at the interface. (C) 2000 Elsevier Science B.V. All rights reserved.