C. Furbock et al., Interferometric temperature mapping during ESD stress and failure analysisof smart power technology ESD protection devices, J ELECTROST, 49(3-4), 2000, pp. 195-213
Breakdown homogeneity and triggering of bipolar transistor action are studi
ed in Smart Power technology ESD protection devices via measurements of tem
perature distribution and thermal dynamics by a laser interferometric techn
ique. Temperature changes in the devices biased in the avalanche multiplica
tion or snapback region are monitored by ns-time scale measurements of the
optical phase shift. The distribution of the temperature-induced phase shif
t is correlated with the position of ESD damage obtained by backside IR mic
roscopy. (C) 2000 Elsevier Science B.V. All rights reserved.