New polymer materials for nanoimprinting

We have investigated new aromatic polymers for nanoimprint and subsequent d ry etching, namely thermoset and thermoplastic compounds. They were tested in a SiO2 patterning process under low pressure and high plasma density con ditions and feature a selectivity about twice as high as poly(methylmethacr ylate) (PMMA). The imprint behavior is comparable to PMMA and, in particula r, the thermoplastic polymers show excellent imprint quality. This was demo nstrated by replication of large arrays of lines down to 50 nm width. The t hermoset polymers showed excellent dry etch stability and Teflon-like antis ticking layers helped to imprint them without sticking. (C) 2000 American V acuum Society. [S0734-211X(00)04504-2].