In situ reflectance-difference spectroscopy of doped CdTe and ZnTe grown by molecular beam epitaxy

Citation
Re. Balderas-navarro et al., In situ reflectance-difference spectroscopy of doped CdTe and ZnTe grown by molecular beam epitaxy, J VAC SCI B, 18(4), 2000, pp. 2224-2228
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
4
Year of publication
2000
Pages
2224 - 2228
Database
ISI
SICI code
1071-1023(200007/08)18:4<2224:ISRSOD>2.0.ZU;2-C
Abstract
We have used reflectance-difference (RD spectroscopy (UW-visible energy ran ge) during the growth and doping process of CdTe(001) and ZnTe(001) layers by molecular beam epitaxy (MBE), The MBE chamber is equipped with an electr on cyclotron resonance cell to generate N plasma and a ZnCl2 effusion cell for the p- and n-type doping, respectively. After the first stages of the g rowth and prior doping, different spectral features were found as we change d from Cd or Zn to Te stabilized conditions due to surface anisotropy. Howe ver, as the doping of the growing layer further increased, the RD spectra o f both surfaces showed resonances around E-1 and E-1+Delta(1) interband tra nsitions due to the linear electro optic (LEO) effect, Although RD spectra exhibit similar line shapes dominated by surface transitions, differences d ue to the LEO can be isolated. Different Fermi level pinning mechanisms are proposed for both materials because the RD measurements of the LEO strongl y depend on surface termination. (C) 2000 American Vacuum Society. [S0734-2 11X(00)06704-4].