Ek. Williams et al., LOSS MEASUREMENTS AND STOICHIOMETRIC DEPENDENCE OF TI AND O IMPLANTEDLINBO3 WAVE-GUIDES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 512-514
Planar waveguides created by the implantation at 500 degrees C of 2.5
x 10(17) Ti ions/cm(2) and 2.5, 5.0 and 7.5 x 10(17) O ions/cm(2) have
been characterized for loss by the scattered light and cutback techni
ques, Results indicate losses of less than 2.5 dB/cm to 3 dB/cm for wa
veguides with a Ti:O ratio of 1:3 and losses of over 7 dB/cm2 for wave
guides with Ti:O ratios of I: 1 and 1:2.