Roughness and oxidation: application to NiO growth on Ni at 800 degrees C

Authors
Huntz, AM Lefevre, B Cassino, F
Citation
Am. Huntz et al., Roughness and oxidation: application to NiO growth on Ni at 800 degrees C, MAT SCI E A, 290(1-2), 2000, pp. 190-197
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
ISSN journal
09215093 → ACNP
Volume
290
Issue
1-2
Year of publication
2000
Pages
190 - 197
Database
ISI
SICI code
0921-5093(20001015)290:1-2<190:RAOATN>2.0.ZU;2-4
Abstract
The changes with oxidation time of the oxide outer surface roughness, the o xide grain size and the oxidation rate constant k(c) for NiO growth on Ni w ire studied at 800 degrees C in 1 atm oxygen. The roughness was determined by optical interferometry establishing 2D-profiles and SD-images. Correlati ons were found between the variations of the oxide outer surface roughness or the k(c) values and the oxide grain size. These are attributed to the de crease of the oxide grain boundary density with time, which induces a decre ase of the effective diffusion coefficient. (C) 2000 Elsevier Science S.A. All rights reserved.