A one step procedure has been developed to grow beta-silicon carbide (beta-
SiC) nanorods from a solid carbon and silicon source on silicon substrates
using a hot filament chemical vapor deposition. The growth process was cata
lyzed by the impurities of metallic particles confined in the solid source
plate made of a mixture of graphite and silicon powders pressed at 150 degr
ees C. Hydrogen was introduced into a reaction chamber to react with the so
lid source. The resulting process produced, hydrocarbon and hydrosilicon ra
dicals, which subsequently reacted on the Si substrate surface and presumab
ly formed SiC nanorods. The nanorods consisted of a crystalline beta-SiC co
re with an amorphous silicon oxide shell layer. The nanorods were 10-30 nm
in diameter and less than 1 mu m in length. Field emission characteristics
of the beta-SiC nanorods were investigated using current-voltage measuremen
ts and the Fowler-Nordheim equation. The silicon carbide nanorods exhibited
high electron field emission with high stability. Along with the ease of p
reparation, these silicon carbide nanorods are believed to have potential a
pplication in electron field emitting devices. (C) 2000 Elsevier Science S.
A. All rights reserved.